Fujifilm, a Japanese firm, is set to develop a greenfield semiconductor materials manufacturing facility in India. The total investment for this project is estimated at 800 INR-Crore.
The company plans to start construction by October 2026, while commercial production is expected in FY 2028. The Fujifilm India facility will be developed in phases, with Phase 1 including the process to support front-end process chemicals. In Phase 2, it will undertake the area of semiconductor surface conditioning materials and high-purity chemicals.
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With this facility, Fujifilm plans to add new semiconductor materials manufacturing capacity in India. Moreover, the phased development will expand domestic production infrastructure for specialized chemicals and materials used in semiconductor manufacturing.
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